发明名称 MANUFACTURE OF FILM RESISTANCE ELEMENT
摘要 <p>PURPOSE:To make possible an adjustment of the resistance value of a resistance element in a direction, which the resistance value is reduced, by a method wherein a plurality of resistance film materials are selectively connected in parallel and the resistance value of the resistance element is positioned between the maximum value and the minimum value of a resistance value which is changed. CONSTITUTION:A plurality of resistance film materials 13-1 to 13-5, each one end of which is connected to a common electrode 11 and the other ends of which are respectively connected to individual electrodes 12-1 to 12-5, are formed on an insulating substrate. Solder fluxes 14 are printed in such a way that proximity parts (d) between the electrodes 12-1 to 12-5 are filled with the fluxes 14 and after that, solder pastes 15 are painted on the fluxes 14. Then, a laser beam is emitted on one of the pastes 15 formed between the connected electrodes 12-1 to 12-5, such as the paste 15 at the left end, it is melted and is cooled and the fluxes 14 are cleaned, whereby a resistance element 17 consisting of the film materials 13-1 to 13-5 connected in parallel with a solder 16 is completed. Thereby, it becomes possible to adjust the resistance value of the element 17 in a direction, in which the resistance value is reduced, and the setting of a resistance value to a check on the characteristics of an electronic circuit, a change in specifications or the like is facilitated.</p>
申请公布号 JPH04177805(A) 申请公布日期 1992.06.25
申请号 JP19900306848 申请日期 1990.11.13
申请人 FUJITSU LTD 发明人 FUJISAWA KAZUHISA;KIMURA YUJI;HANANO MASAYOSHI;HARUHARA HIDEYASU
分类号 H05K1/16;H01C17/24 主分类号 H05K1/16
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