发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PURPOSE:To contrive reduction of defectively formed pattern by a method wherein, when the solvent dripping on a semiconductor substrate is shaked off by centrifugal force, a light-shielding sensor, with which the solvent scattering toward the upper part of the cup, is arranged on the upper part of the cup. CONSTITUTION:Gas 5, with which a semiconductor substrate 1 is vacuum-sucked into a cup and centrifugal force is worked for rotation of the substrate 1 by the driving force of a pulse motor, and a nozzle 3, with which a solvent is dripped or sprayed on the substrate, are provided on the title device. Moreover, a mist-detecting light shielding sensor 9 is provided on the upper part of the cup 4, and a liquid outlet 7 and an exhaust hole 8 are provided on the lower cup 6. At this point, when the displacement is decreased, the mist scattered from the substrate 1 flies up by the wind generated by the centrifugal force of the gas 5, the rotation of the pulse motor 2 is controlled by detecting the blown up mist, or the dripping of the solvent is controlled, and the successive occurrence of defective pattern is prevented. As a result, the decrease in formation of defective pattern can be achieved.
申请公布号 JPH04188610(A) 申请公布日期 1992.07.07
申请号 JP19900313601 申请日期 1990.11.19
申请人 NEC KYUSHU LTD 发明人 TAKAGI YOICHI
分类号 G03F7/16;B05C11/08;G03F7/30;H01L21/027 主分类号 G03F7/16
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