| 摘要 |
PURPOSE:To eliminate the factor of degradation of alignment accuracy between a mask and a substrate created in an off-axis method by a method wherein an original is aligned with the predetermined position of an apparatus main part by every step and the original and an object to be exposed are aligned with each other by using the alignment mark of the original and the alignment mark of the object to be exposed. CONSTITUTION:When 1st mask 1a is exposed, at first the mask 1a is aligned with mask reference marks 17 on an apparatus side by a microscope 19. After that, the alignment marks of the mask 1a and the alignment marks of a substrate 3 formed in a previous process are measured by the microscope 19 to align the mask 1a and the substrate 3 and the 1st exposure is performed. Then, when 2nd mask 1b is exposed, the mask 1b is also aligned with the mask reference marks 17 on the apparatus side by the microscope 19 like the 1st mask and then the alignment marks of the mask 1b and the alignment marks of the substrate 3 are measured by a microscope 19 to align the mask 1b and the substrate 3 by driving the substrate 3 and the 2nd exposure is performed. The same exposure operation is repeated for the other masks thereafter and a large picture such as a liquid crystal display can be formed.
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