发明名称 SPIN COATING METHOD AND APPARATUS
摘要 <p>PURPOSE:To uniformize the coating film on a substrate over the entire surface of the substrate, in preparing a color film due to a spin coating system, by rotating the substrate while the center of rotation thereof is moved in a horizontal direction. CONSTITUTION:At the time of spin coating when colored varnish 3 prepared by dispersing org. pigment 2 in a resin solution 1 is a plastic or thixotropic fluid because of its flow characteristic, the position of a substrate 4 is moved in a horizontal direction simultaneously with the rotation thereof to make it possible to uniformly apply the colored varnish on a rotary shaft. That is, the glass substrate 4 is set to a stand 9 from a substrate holder 6 by an extrusion mechanism 8 and subsequently supplied to a substrate rotating and sliding mechanism part C by a feed mechanism E. When the colored varnish 3 is supplied to the substrate 4 from a coating liquid supply mechanism B through a filter 12, the substrate 4 begins to reciprocally move in the horizontal direction simultaneously with rotation and the varnish is uniformized.</p>
申请公布号 JPS63107769(A) 申请公布日期 1988.05.12
申请号 JP19860254503 申请日期 1986.10.25
申请人 TOPPAN PRINTING CO LTD 发明人 HOSHI HISAO;MARUMICHI HIROTAKE
分类号 G02B5/20;B05C11/08;B05D1/40 主分类号 G02B5/20
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