| 摘要 |
PROBLEM TO BE SOLVED: To execute a carrying process by a carrying equipment without disturbance, considering a time interval capable of feeding the substrate of a processing object to a substrate processor. SOLUTION: A substrate processor for executing this method is provided with film formation chambers R1, R2 and R3-R5 for performing the same processing and performs the carrying processing of the substrate to the processing chambers (processing chamber group) by a same carrying device T2. In this case, a value obtained by dividing the time required for a substrate processing in the processing chamber and the time required for a substrate carrying processing by the number of chambers in the processing chamber group is set as tact time and the substrate is fed to the substrate processor at every tact time. Further, the time more than the time required for the carrying processing of one time is set for plural within the tact time as a carrying slot, and the carrying processing of the substrate to the respective film formation chambers is performed by the carrying device T2 in synchronism with the carrying slot. |
