发明名称 ELECTRON BEAM IRRADIATION DEVICE AND METHOD
摘要 PROBLEM TO BE SOLVED: To carry out high precision recording by making focusing easy and accurate for the electron beam to the original 1 in an electron beam irradiation device that makes recording by irradiating the original 1 with the electron beam. SOLUTION: On the slide table 6 of a support mechanism 2 which supports the original 1, a focusing stage 30 is provided at the side adjacent to the original 1. When recording, the electron beam is first irradiated to the focusing stage 30 for focusing, then to the original 1 for recording.
申请公布号 JP2002260296(A) 申请公布日期 2002.09.13
申请号 JP20010054741 申请日期 2001.02.28
申请人 SONY CORP 发明人 SASAKI JUN;AKI YUICHI;MIURA YOSHIHISA
分类号 G03F7/20;G01Q30/16;G11B7/26;G11B9/10;G21K5/10;H01J37/305;(IPC1-7):G11B7/26 主分类号 G03F7/20
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