| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce the transfer of forces that are coupled by a liquid filled, in at least a part of a space between the last element of a projection system and a substrate, when moving the substrate with respect to the projection system. <P>SOLUTION: There is provided a lithographic projection apparatus in which a liquid is filled, in at least a part of a space between the definitive element of a projection system and a substrate by a liquid supply system. The projection system is separated into two physical portions. Since there is no connection parts between the two parts of the projection system, all the vibrations that are induced at the lower part by the forces that are coupled via the liquid filling the space, when the substrate is moved to the liquid supply system, are surely brought to only the lower part of a lens system and not to the upper part. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
