| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve uniformity of film thickness of a resist film made of applied resist agent by reducing distribution of film thickness of an applied film when it is applied with an application apparatus named 'CAP coater'. <P>SOLUTION: A resist agent 21 is made contact with a surface 10a to be applied through the top end of an application nozzle 22 and then a space G between the top end of the application nozzle 22 and the surface 10a is kept within the range less than a liquid separation distance in which the resist agent 21 in contact with the surface 10a just separates from the surface 10a and 50% or more of the distance. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
