发明名称 Method and its apparatus for inspecting particles or defects of a semiconductor device
摘要 An apparatus for optically inspecting particles and/or defects correlates sizes of particles and/or defects to a cause of failure in an inspection result. A data processing circuit points out a cause of failure from the statistics on the inspection result, and displays information on the inspection result. A failure analysis is conducted by setting a threshold for identifying a failure in each of regions on a semiconductor device or the like to statistically evaluate detected particles.
申请公布号 US7262425(B2) 申请公布日期 2007.08.28
申请号 US20050190838 申请日期 2005.07.28
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 NISHIYAMA HIDETOSHI;NOGUCHI MINORI;OHSHIMA YOSHIMASA;HAMAMATSU AKIRA;WATANABE KENJI;WATANABE TETSUYA;JINGU TAKAHIRO
分类号 G01N21/88;G01N21/27;G01N21/47;G01N21/94;G01N21/95 主分类号 G01N21/88
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