发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROLENS, MICROLENS, AND METHOD FOR FORMING MICROLENS
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for forming a microlens having excellent heat resistance. <P>SOLUTION: The photosensitive resin composition for forming the microlens contains a copolymer which has repeated units having a heat cross-linking group, and a photosensitizer, wherein the mass average molecular weight of the copolymer is 10,000-30,000. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009020462(A) 申请公布日期 2009.01.29
申请号 JP20070184888 申请日期 2007.07.13
申请人 TOKYO OHKA KOGYO CO LTD 发明人 SUGIMOTO YASUAKI;KASE YUMIKO
分类号 G02B1/04;C08F220/30;C08G59/32;C08G65/18;G02B3/00;G03F7/023 主分类号 G02B1/04
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