Enhanced etching processes using remote plasma sources

摘要

Methods of etching a patterned substrate may include flowing an oxygen-containing precursor into a first remote plasma region fluidly coupled with a substrate processing region. The oxygen-containing precursor may be flowed into the region while forming a plasma in the first remote plasma region to produce oxygen-containing plasma effluents. The methods may also include flowing a fluorine-containing precursor into a second remote plasma region fluidly coupled with the substrate processing region while forming a plasma in the second remote plasma region to produce fluorine-containing plasma effluents. The methods may include flowing the oxygen-containing plasma effluents and fluorine-containing plasma effluents into the processing region, and using the effluents to etch a patterned substrate housed in the substrate processing region.

主权项

1. A method of etching a patterned substrate, the method comprising:
flowing an oxygen-containing precursor into a first remote plasma region fluidly coupled with a substrate processing region while forming a plasma in the first remote plasma region to produce oxygen-containing plasma effluents; flowing a fluorine-containing precursor into a second remote plasma region fluidly coupled in series between the first remote plasma region and the substrate processing region while forming a plasma in the second remote plasma region to produce fluorine-containing plasma effluents, wherein the fluorine-containing precursor bypasses the first plasma region; flowing the oxygen-containing plasma effluents into the second remote plasma region during formation of the plasma in the second remote plasma region to mix with the fluorine-containing plasma effluents; flowing the oxygen-containing plasma effluents and fluorine-containing plasma effluents into the processing region together from the second remote plasma region; and etching a patterned substrate housed in the substrate processing region with the oxygen-containing and fluorine-containing plasma effluents.