Methods of forming and programming memory devices with isolation structures

摘要

Methods of programming and forming memory devices. Methods of programming include biasing a control gate of a selected memory cell of the memory device to a first voltage, the control gate being over a first conductive region having a first conductivity type and the first conductive region being over a second conductive region having a second conductivity type different than the first conductivity type; biasing the second conductive region to a second voltage to forward bias the junction from the second conductive region to the first conductive region; and injecting electrons into a charge-storage node of the selected memory cell from the second conductive region. The first conductive region and the second conductive region are contained within a dielectric isolation structure in which at least the selected memory cell is contained.

主权项

1. A method of programming a memory device, comprising:
biasing a control gate of a selected memory cell of the memory device to a first voltage, the control gate being over a first conductive region having a first conductivity type and the first conductive region being over a second conductive region having a second conductivity type different than the first conductivity type; biasing the second conductive region to a second voltage to forward bias a junction from the second conductive region to the first conductive region; and injecting electrons into a charge-storage node of the selected memory cell from the second conductive region; wherein the first conductive region and the second conductive region are contained within a dielectric isolation structure in which at least the selected memory cell is contained.