发明名称 METHOD PERFORMING ASHING
摘要 PROBLEM TO BE SOLVED: To suppress generation of foreign matter, in ashing using a plasma processing apparatus in a silica tube.SOLUTION: A method performing the ashing includes a step for heating an object to be processed housed in the processing container of a plasma processing apparatus, where rare gas is supplied into a silica tube and the processing container, pressure in the space of the silica tube is set to a first pressure, and the object to be processed is heated without generating plasma in the silica tube, and a step for generating plasma of HO in the silica tube, following to the step for heating the object to be processed, in a state where the pressure in the space of the silica tube is set to a second pressure lower than the first pressure.SELECTED DRAWING: Figure 1
申请公布号 JP2016111033(A) 申请公布日期 2016.06.20
申请号 JP20140243667 申请日期 2014.12.02
申请人 TOKYO ELECTRON LTD 发明人 NAGATOMO YU;HAYASAKA TOMOSUKE
分类号 H01L21/3065 主分类号 H01L21/3065
代理机构 代理人
主权项
地址