| 摘要 |
<p>PURPOSE:To reduce the deposition of dust in the optical inspection of a reticle mask to be used for the projection to and exposure of a semiconductor substrate. CONSTITUTION:A reticle mask 1 of specified length and angle is used to constitute a holder 2. A resin frame of 'Teflon(R)' having specified thickness and width is used, and a reticle mask 1 is placed on a step having specified width. A metallic frame 3 of aluminum alloy having specified thickness and width is used, the reticle mask 1 is put on the resin frame 4, and a specified voltage is impressed on the metallic frame 3 from a power source 5.</p> |
