发明名称 Semiconductor device and manufacturing method of the same
摘要 An object is to provide a semiconductor device with high aperture ratio or a manufacturing method thereof. Another object is to provide semiconductor device with low power consumption or a manufacturing method thereof. A light-transmitting conductive layer which functions as a gate electrode, a gate insulating film formed over the light-transmitting conductive layer, a semiconductor layer formed over the light-transmitting conductive layer which functions as the gate electrode with the gate insulating film interposed therebetween, and a light-transmitting conductive layer which is electrically connected to the semiconductor layer and functions as source and drain electrodes are included.
申请公布号 US9397255(B2) 申请公布日期 2016.07.19
申请号 US201414584013 申请日期 2014.12.29
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 Kimura Hajime
分类号 H01L27/12;H01L33/02;H01L49/02;H01L29/786;H01L27/32 主分类号 H01L27/12
代理机构 Nixon Peabody LLP 代理人 Nixon Peabody LLP ;Costellia Jeffrey L.
主权项 1. A semiconductor device comprising a first conductive film; a second conductive film; a third conductive film over and in contact with the first conductive film; a fourth conductive film over and in contact with the second conductive film; a first insulating film over the first conductive film, the third conductive film and the fourth conductive film; a pixel electrode over the third conductive film with the first insulating film therebetween; and a transistor comprising a semiconductor film, a gate electrode, a source electrode, a drain electrode and a gate dielectric, wherein the first conductive film and the second conductive film are transparent, and the third conductive film and the fourth conductive film are not transparent, wherein one of the source electrode and the drain electrode is electrically connected with the pixel electrode, wherein the semiconductor film is an oxide comprising indium (In), gallium (Ga) and zinc (Zn), wherein a first portion of the second conductive film works as the gate electrode, wherein a first portion of the pixel electrode works as an upper electrode of a storage capacitor, wherein a first portion of the first conductive film works as a lower electrode of the storage capacitor, wherein a first portion of the first insulating film works as a dielectric of the storage capacitor, wherein the storage capacitor is transparent such that a light passes through the storage capacitor, and wherein an entirety of the third conductive film overlaps with the first conductive film while the first portion of the first conductive film does not overlap with the third conductive film.
地址 Kanagawa-ken JP