发明名称 |
Systems and methods for controlling a plasma edge region |
摘要 |
Systems and methods for controlling a plasma edge region are described. One of the systems includes a top electrode and a bottom electrode. The system also includes an upper electrode extension and a lower electrode extension. At least a portion of the plasma edge region is formed between the upper electrode extension and the lower electrode extension. The system includes a circuit to control a radio frequency signal at the upper electrode extension. |
申请公布号 |
US9396908(B2) |
申请公布日期 |
2016.07.19 |
申请号 |
US201113310673 |
申请日期 |
2011.12.02 |
申请人 |
Lam Research Corporation |
发明人 |
Marakhtanov Alexei;Dhindsa Rajinder |
分类号 |
H01J37/32;H05B7/18 |
主分类号 |
H01J37/32 |
代理机构 |
Martine Penilla Group, LLP |
代理人 |
Martine Penilla Group, LLP |
主权项 |
1. A system comprising:
a top electrode and a bottom electrode for generating an electric field; one or more upper insulating rings surrounding a portion of the top electrode; a lower insulating ring surrounding a portion of the bottom electrode; an upper electrode extension surrounding a portion of the one or more upper insulating rings; a lower electrode extension surrounding a portion of the lower insulating ring, wherein at least a portion of a plasma center region is formed between the top electrode and the bottom electrode, wherein at least a portion of a plasma edge region is formed between the upper electrode extension, the lower electrode extension, and a C-shroud; and a control circuit having an inductor, the control circuit being connected to the upper electrode extension for filtering a first radio frequency signal provided to the upper electrode extension, wherein the top electrode is coupled with ground and the upper electrode extension is coupled with a variable capacitor and the inductor, wherein the variable capacitor is coupled in parallel with the inductor, and a controller that is coupled with the control circuit, wherein the controller is configured to adjust a capacitance of the variable capacitor to provide an impedance to the upper electrode extension such that a potential of a top plasma sheath within the plasma edge region is in phase with a potential of a bottom plasma sheath within the plasma edge region. |
地址 |
Fremont CA US |