发明名称 Systems and methods for controlling a plasma edge region
摘要 Systems and methods for controlling a plasma edge region are described. One of the systems includes a top electrode and a bottom electrode. The system also includes an upper electrode extension and a lower electrode extension. At least a portion of the plasma edge region is formed between the upper electrode extension and the lower electrode extension. The system includes a circuit to control a radio frequency signal at the upper electrode extension.
申请公布号 US9396908(B2) 申请公布日期 2016.07.19
申请号 US201113310673 申请日期 2011.12.02
申请人 Lam Research Corporation 发明人 Marakhtanov Alexei;Dhindsa Rajinder
分类号 H01J37/32;H05B7/18 主分类号 H01J37/32
代理机构 Martine Penilla Group, LLP 代理人 Martine Penilla Group, LLP
主权项 1. A system comprising: a top electrode and a bottom electrode for generating an electric field; one or more upper insulating rings surrounding a portion of the top electrode; a lower insulating ring surrounding a portion of the bottom electrode; an upper electrode extension surrounding a portion of the one or more upper insulating rings; a lower electrode extension surrounding a portion of the lower insulating ring, wherein at least a portion of a plasma center region is formed between the top electrode and the bottom electrode, wherein at least a portion of a plasma edge region is formed between the upper electrode extension, the lower electrode extension, and a C-shroud; and a control circuit having an inductor, the control circuit being connected to the upper electrode extension for filtering a first radio frequency signal provided to the upper electrode extension, wherein the top electrode is coupled with ground and the upper electrode extension is coupled with a variable capacitor and the inductor, wherein the variable capacitor is coupled in parallel with the inductor, and a controller that is coupled with the control circuit, wherein the controller is configured to adjust a capacitance of the variable capacitor to provide an impedance to the upper electrode extension such that a potential of a top plasma sheath within the plasma edge region is in phase with a potential of a bottom plasma sheath within the plasma edge region.
地址 Fremont CA US