| 摘要 |
A semiconductor manufacturing apparatus includes: a stage; and a ventilation duct having a ring-shaped passage enclosing a process space on the stage, a ring-shaped slit allowing a gas supplied to the process space to be led to the ring-shaped passage, and a discharge port allowing the gas inside the ring-shaped passage to the outside. An aperture-area ratio of the slit increases according to an increase in a distance from the discharge port. The semiconductor manufacturing apparatus can improve uniformity of a gas flux at the edge of the stage. |
