| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide eluted liquid adjusting method and device which comes into contact with water with a large area whose change in contact area is small with precision even if the contact time between a resist film and water is as short as one second or less, and adjusting an eluted liquid for accurately measuring an amount of leaching. <P>SOLUTION: In the eluted liquid adjusting method and device, in order to measure an amount of leaching of a photoresist in immersion lithography, a substrate is held horizontally, the surface of which goes downward, on the surface of which a photoresist film is formed by spin-coating a photoresist to be measured, a petri dish filled with liquid is arranged horizontally thereunder, the substrate and the petri dish are translated in the relatively vertical direction while both are held horizontally, and after the photoresist film is caused to come into contact with the surface of the liquid with which the petri dish is filled for a predetermined period of time, both are translated in the relatively vertical direction so that they are separated from each other, and thereby, an amount of leaching that is eluted from the photoresist to the liquid is measured. <P>COPYRIGHT: (C)2009,JPO&INPIT |
