发明名称 The Production of an Image on a Substrate
摘要 1,154,212. Etching. M. BASSAN. 21 June, 1966, No. 27658/66. Heading B6J. [Also in Division G2] A photomechanical process comprises imagewise exposing a material consisting of a glass support coated with a metallic layer and then with a photoresist containing a bichromate and Judean bitumen layer, developing to remove the unexposed areas of the photoresist, etching through the metallic layer and then partly etching the glass support. A different metal or a paint may be deposited on the etched glass support. Specified etchants are nitric or hydrochloric acid for the metallic layer and hydrofluoric acid for the glass support.
申请公布号 GB1154212(A) 申请公布日期 1969.06.04
申请号 GB19660027658 申请日期 1966.06.21
申请人 MAURICE BASSAN 发明人 ALFREDO AVENDANO MARV ZO
分类号 G03F1/08;G03F1/54;G03F1/80;G03F7/04 主分类号 G03F1/08
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