METHOD AND DEVICE FOR TREATING WASTE GAS

摘要

PURPOSE:To highly efficiently remove a harmful gas at a low running cost by heating, oxidizing and decomposing the waste gas from a CVD device under CVD and/or the waste gas from the device under cooling. CONSTITUTION:The waste gas treating device is formed with a waste gas introducing means 1 and a heating, oxidizing and decomposing device 2 for treating the waste gas. The means 1 is composed of a waste gas inlet pipe 3 and a vacuum pump 4. The waste gas inlet pipe 3 is connected to a CVD device 5 and the device 2, and the waste gas 10 consisting of the waste CVD gas 7 generated from a CVD process gas in the CVD device 5 and/or the waste cleaning gas 9 generated by the treatment of a cleaning gas 8 is introduced by the pump 4 into the device 2 through the same waste gas inlet pipe 3. The waste gas is treated in the device 2. As a result, the harmful gas is removed with high efficiency at a low running cost.