| 摘要 |
<p>PURPOSE:To provide equipment capable of treating exhaust gas from CVD device, etc., with low running cost, high efficiency, safety and space-saving. CONSTITUTION:This device for treating exhaust gas is provided with a gas introducing part 8 formed concentrically from the inside to the outside for exhaust gas, gaseous N2 and O2 containing gas in that order, a reaction vessel 12 for heating the exhaust gas, gaseous N2 and O2 containing gas discharged into it and simultaneously heat and oxidation decomposing the exhaust gas, a washing part 16 for washing treated gas containing the heat and oxidation decomposed product, and a discharge part for discharging the washed product to the outside of the system consisting of an exhaust pipe 14 and a drain pipe 15 to discharge the treated exhaust gas made harmless to the outside of the system.</p> |
