发明名称 METHOD AND DEVICE FOR PREPARING EXPOSURE DATA
摘要 <p>PURPOSE:To reduce man-hours for pattern generation intended by a designer, arbitrary angle pattern output and repreparation concerning the method and the device for preparing exposure data. CONSTITUTION:An exposure data preparing method (a) is composed of a graphic data preparation step A, special exposure data preparation step B, special exposure data storage step C, graphic data input step D, graphic processing step E, and exposure data output step F to preferentially output special exposure data when the data of the same figure exist in the exposure data and the special exposure data obtained at the graphic processing step. An exposure data preparing device (b) is composed of a graphic data storing means 1 to store the graphic data of the entire object of exposure, special data storing means 2, graphic data input means 3, graphic data processing means 4 to prepare exposure data I to inputted graphic data, and exposure data output means 5 to select the special graphic data when the data of the same figure exist by comparing the exposure data I with the special exposure data.</p>
申请公布号 JPH04291254(A) 申请公布日期 1992.10.15
申请号 JP19910056433 申请日期 1991.03.20
申请人 FUJITSU LTD;FUJITSU VLSI LTD 发明人 MIYAJIMA MASAAKI
分类号 G03F1/68;H01L21/027;H01L21/30;H04N1/23 主分类号 G03F1/68
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