发明名称 COMPOSITIONS A BASE DE RESINES PHOTOSENSIBLES ET PROCEDE POUR OBTENIR DES RESERVES COLOREES A L'AIDE DE CES COMPOSITIONS
摘要 1343609 Photo-sensitive materials EASTMAN KODAK CO 20 April 1971 [20 April 1970] 10078/71 Heading G2C [Also in Division C3] A photo-sensitive composition comprises a polymer having residual conjugated double bands capable of cross-linking upon exposure, a solvent for the polymer and a pigment of particles completely coated with a substance insoluble in the solvent. Specified polymers are polyesters of diols with diacids containing conjugated double bands and optionally mixed with aromatic diacids as in Specification 1312655 or the polymers of Specifications 846908 and 951928. The composition may contain a sensitiser (methyl benzothiazolylidenedithioacetate). Specified pigments are Monastral Blue RFS and BGS and the pigments of Specifications 978242 and 1149898 and French Specifications 1440131 and 1476138. The composition is coated on a support and imagewise exposed and developed to remove unexposed areas and produce a coloured resist image which may be used as a printing plate. The coated pigment results in a more stable composition with less tendency to crystallize or flocculate.
申请公布号 BE765969(A1) 申请公布日期 1971.10.19
申请号 BE19710765969 申请日期 1971.04.19
申请人 EASTMAN KODAK CY, 343, STATE STREET, ROCHESTER, ETAT DE NEW YORK 14650 (E.U.A.), 发明人 KODAK PATHE.
分类号 C08G63/52;G03F1/10;G03F1/56;G03F7/038;G03F7/105;(IPC1-7):G03C/ 主分类号 C08G63/52
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