| 发明名称 |
METHOD OF MANUFACTURING PHOTOOMASK FOR PHOTO ETCHING |
| 摘要 |
PURPOSE:To obtain an inversion photo-mask for photo-etching with the use of a hard mask per se by driving particles accelerated by high energy in a photo-resist film or other organic film. |
| 申请公布号 |
JPS5210680(A) |
申请公布日期 |
1977.01.27 |
| 申请号 |
JP19750071754 |
申请日期 |
1975.06.13 |
| 申请人 |
NIPPON ELECTRIC CO |
发明人 |
OGUCHI TOSHIO;YAMAMOTO KIYOUJI |
| 分类号 |
G03F1/00;G03F1/68;G03F1/80;H01L21/027;H01L21/302 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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