发明名称 INSULATED GATE SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SAME
摘要 An insulated gate semiconductor device contains a protective element for protecting the gate electrode of an insulated gate field effect transistor. The protective element is formed of the same semiconductor layer as that of the gate electrode of the insulated gate field effect transistor and is formed integrally with the gate electrode on an insulating film formed on the surface of a semiconductor substrate.
申请公布号 MY8600555(A) 申请公布日期 1986.12.31
申请号 MY19860000555 申请日期 1986.12.30
申请人 HITACHI LTD 发明人 ISAO YOSHIDA;TAKEAKI OKABE;MITSUO ITO;KAZUTOSHI ASHIKAWA;TETSUO IIJIMA
分类号 H03F1/52;H01L27/02;H01L27/04;H01L27/06;H01L29/78;H02H7/20;H03F1/42;(IPC1-7):H01L29/78;H01L29/58 主分类号 H03F1/52
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