| 摘要 |
<p>PURPOSE:To provide an alkali-developable resist ink compsn. which is highly sensitive and excellent in curability and resistance to water, solvent, and heat. CONSTITUTION:An alkali-developable resist ink compsn. which contains a specific resin curable by actinic radiation and a photopolymn. initiator. The resin is obtd. from a specific oxirane compd. prepd. by epoxidizing a dimer of 2,7- hydroxynaphthalene alone or together with beta-naphthol, an unsatd. monocarboxylic acid such as (meth)acrylic acid, and a polycarboxylic acid anhydride.</p> |
