| 摘要 |
<p>PURPOSE:To accurately inspect a mask for light exposing having a shape different from design data by receiving the influence of a proximity effect by processing the design data so as to suppress the generation of pseudo defects, thereby forming data for inspection. CONSTITUTION:The data for inspection deforming the data for inspection (dotted line) form the original design data (broken line) is formed only for the point (part within a circle A) where most of the pseudo defects (the parts, such as roundness of the square parts of mask patterns, which are not intrinsic defects, and are recognized erroneously as defect at the time of inspection) are generated in the case of inspection of the mask for light exposing having the fine mask patterns by using a defect inspecting device of a system for comparing and inspecting the design data and the mask patterns. The data for inspection formed in such a manner and the actually formed mask patterns are comparatively inspected. As a result, the mask for light exposing having the shape different from the design data by receiving the influence of the proximity effect in such a case of isolated existence of the fine patterns is correctly inspected.</p> |
