发明名称 |
Low Kappa dielectric inorganic/organic hybrid films and method of making |
摘要 |
A method of depositing a dielectric film exhibiting a low dielectric constant in a semiconductor and/or integrated circuit by chemical vapor deposition (CVD) is provided. The film is deposited using an organosilicon precursor in a manner such that the film is comprised of a backbone made substantially of Si-O-Si or Si-N-Si groups with organic side groups attached to the backbone. |
申请公布号 |
AU3562799(A) |
申请公布日期 |
1999.11.16 |
申请号 |
AU19990035627 |
申请日期 |
1999.04.15 |
申请人 |
SILICON VALLEY GROUP THERMAL SYSTEMS, LLC |
发明人 |
PETER ROSE;EUGENE LOPATA;JOHN FELTS |
分类号 |
B32B9/04;C09D4/00;C23C16/30;C23C16/40;H01L21/312;H01L21/316;H01L21/318;H01L21/768;H01L23/522 |
主分类号 |
B32B9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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