| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for forming a multilayer film wherein a sputtering room can be easily increased or decreased according to the required number of the forming films and the entirety of the apparatus can be arranged compact. SOLUTION: The apparatus comprises a film forming chamber, a transfer mechanism chamber for carrying in or out a substrate on which a film is to be formed, a susceptor containing the substrate, an internal transfer mechanism to rotationally transfer the susceptor placed thereon, a plurality of a single film forming units 111-115 arranged substantially straight, a loader 116 and an unloader 117 carrying in and our respectively the substrate arranged at the both ends of the film forming unit, a vacuum transfer chamber 120 arranged to couple these units and kept in a vacuum therein and a substrate transfer mechanism 118 for transferring the substrate by reciprocating motions. |
