APPARATUS FOR CONDITIONING POLISHING PAD TO EFFECTIVELY ELIMINATE PARTICLES FIRMLY ATTACHED TO PORE OR GROOVE OF POLISHING PAD

摘要

PURPOSE: An apparatus for conditioning a polishing pad is provided to effectively eliminate the particles firmly attached to a pore or a groove of a polishing pad by installing a vibration inducing apparatus in a conditioner. CONSTITUTION: A substrate(130) capable of being transferred by a driving unit(110) is prepared. A roughness forming unit(150) comes in contact with the upper surface of a polishing pad(10) to form predetermined roughness on the upper surface of the polishing pad, installed in the bottom of the substrate. A vibration generating unit generates vibration in the polishing pad, installed in the bottom of the substrate.