| 摘要 |
<p>This disclosure describes system (s) and/or method (s) enabling contacts 504, 704, 904, and/or 1102 for individual nanometer-scale-thickness layers 402, 602, 802, and/or 1105 of a multilayer film 1104. The contacts are formed during deposition of the layers using a shadow mask having protrusions 408.</p> |
| 申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.;KORNILOVICH, PAVEL;MARDILOVICH, PETER;RAMAMOORTHI, SRIRAM |
发明人 |
KORNILOVICH, PAVEL;MARDILOVICH, PETER;RAMAMOORTHI, SRIRAM |
