发明名称 |
METHOD OF MANUFACTURING OPTICALLY ADJUSTABLE REFLECTION PREVENTION COATING |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and a system for changing optical characteristics in an adjustable resist usable for manufacturing an electron device such as an integrated circuit. <P>SOLUTION: The method and the system for improving precision in measurement using optical measurement are provided. Further the method and the system using an adjustable resist layer are provided. The adjustable resist layer provides first and second sets of optical characteristics before and after exposure, respectively. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008098631(A) |
申请公布日期 |
2008.04.24 |
申请号 |
JP20070245158 |
申请日期 |
2007.09.21 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
WILLIS JAMES E;KLEKOTKA JAMES E |
分类号 |
H01L21/027;G03F7/039;G03F7/11;G03F7/26 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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