| 发明名称 |
Apparatus and method for measuring the erosion depth of a sputtering target |
| 摘要 |
The present invention discloses an apparatus and a method for measuring the erosion depth of a sputtering target, the apparatus for measuring the erosion depth of a sputtering target comprises a guiding rail, a positioning component and an erosion depth measuring device, the erosion depth measuring device is provided at the guiding rail in a relatively movable manner, the positioning component is disposed at the two sides of the guiding rail so as to support the guiding rail. According to the present invention, the erosion depth data can be known timely, and the utilization ratio of the sputtering target can be improved. |
| 申请公布号 |
US9366521(B2) |
申请公布日期 |
2016.06.14 |
| 申请号 |
US201314111801 |
申请日期 |
2013.07.19 |
| 申请人 |
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
Fu Pinzheng;Chen Chao-Mu |
| 分类号 |
G01B5/18 |
主分类号 |
G01B5/18 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for measuring the erosion depth of a sputtering target, comprising a guiding rail, a positioning component and an erosion depth measuring device, wherein the erosion depth measuring device is provided at the guiding rail in a relatively movable manner, the positioning component is disposed at the two sides of the guiding rail so as to support the guiding rail. |
| 地址 |
Shenzhen, Guangdong KR |
