| 摘要 |
PROBLEM TO BE SOLVED: To provide a reflective mask blank having a shading band of high shading properties where mask quality degradation due to defects caused by particles is prevented by forming a shading band in the mask blank stage, while eliminating damage on an absorption layer and change in the optical properties thereof, and to provide a method of manufacturing the same, and a reflective mask manufactured by using the reflective mask blank.SOLUTION: In a reflective mask blank 100 including a multilayer reflection layer 21 of EUV light and an absorption layer 51 formed, in this order, on a substrate, a flame-like shading band region (multilayer reflection layer removal part 21a) having a reflectance lower than that of the absorption layer is formed on the outside of a circuit patterning region formed by removing at least the absorption layer by etching.SELECTED DRAWING: Figure 1 |
