ATOMIC LAYER DEPOSITION OF PLATINUM GROUP METAL THIN FILMS

摘要

Disclosed is an atomic layer deposition method of a platinum group metal thin film. The atomic layer deposition method of a platinum group metal thin film comprises: a step of preprocessing H_2S or NH_3 on a substrate; and a step of forming a platinum group metal thin film on the substrate. As such, the present invention enables a continuous deposition of the thin film by controlling a size and distribution of platinum group nanoparticles.