PHOTO CHEMICAL REACTOR FOR SILICON THIN FILM DEPOSITION,申请号KR1019880011867-传众专利搜索

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发明名称	PHOTO CHEMICAL REACTOR FOR SILICON THIN FILM DEPOSITION
摘要
申请公布号	KR1019930001193(B1)	申请公布日期	1993.02.20
申请号	KR1019880011867	申请日期	1988.09.14
申请人		发明人
分类号		主分类号
代理机构		代理人
主权项
地址

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