Verfahren zum Herstellen von photolithographischen Masken

摘要

A method of making a photolithographic mask comprising the steps of depositing upon a transparent substrate a thin film of a polymeric material which is capable of being pyrolized to form thin film on the substrate, heating the film in order that the film is pyrolized, and removing selected areas of the pyrolized film in an oxidizing atmosphere by means of a laser beam to form the desired mask pattern.