| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lighting device for a lithography system without a beam splitter. <P>SOLUTION: The lighting device for the lithography system includes a mask disposed along an optical axis, and first and second refractive groups disposed along the optical axis in a cooperative arrangement with the mask. Further, the device includes first and second reflective devices to reflect images outputted from the first and second refractive groups, and a spatial optical modulator (SLM) disposed along the optical axis in the cooperative arrangement with the first and second reflective devices. Active regions of the mask and SLM are disposed outside the axis. <P>COPYRIGHT: (C)2008,JPO&INPIT |
