发明名称 Molybdenum or tungsten deposition - with nickel using chemical plating baths contg molybdates or tungstates
摘要 <p>Metals or non-metals are chemically plated with Ni contg. up to 5% W or Mo by adding a molybdate or tungstate to a conventional aq. bath for electroless Ni deposition. Pref. amount molybdate added to bath is 0.005-0.1 (esp. 0.01-0.09) mol/1, and pref. amount tungstate added is 0.01-0.5 (esp. 0.05-0.2) mol/1. Pref. bath contains added citrate, tartrate and/or sugar as complexing agents, and pref. added hypophosphite ions as reducing agents.</p>
申请公布号 DE2046521(A1) 申请公布日期 1972.03.23
申请号 DE19702046521 申请日期 1970.09.22
申请人 LICENTIA GMBH 发明人
分类号 C23C18/50;(IPC1-7):23C3/02 主分类号 C23C18/50
代理机构 代理人
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