| 摘要 |
<p>PURPOSE:To obtain the manufacturing method of a mask for X-ray exposure (called as 'X-ray mask' in the following) which is excellent in pattern position precision. CONSTITUTION:An X-ray transparent retaining film 2 and an X-ray absober thin film 3 are formed in order on a substrate 1, and a mask 4 for back etching is formed on the opposite surface of a substrate 1. An X-ray mask blank 5 formed in the above manner is used. After a reinforcement frame 7 is bonded to the rear of the X-ray mask blank 5 via adhesive agent 6, the X-ray absorber thin film 3 is patterned, and then back etching of the substrate 1 is performed.</p> |
