| 摘要 |
PURPOSE:To form a thin film with ideal periodicity by carrying out vapor deposition while cooling a vapor-deposition substrate to specific temperature. CONSTITUTION:The vapor-deposition substrate 1 having a vapor-deposition surface made of glass partially and a ''Tetoron'' film for the remainder, electron gun mouth parts 2 and 3, and automatic shutters 4 and 5 are provided and further a film thickness measuring element 6, and film thickness measuring elements 7 and 8 used for monitoring the vapor-deposition condition of a vapor- deposited material are provided. This device is used to carry out vapor deposition while the vapor-deposition substrate 1 is cooled to -10--70 deg.C. For example, while a vapor-deposition speed is about 0.1Angstrom /sec, a degree of vacuum during the varpor deposition is about 1X10<-8> torr, and the cooling temperature of the substrate is -50 deg.C, an artificial thin grating film having 50 cycles each consisting of a 42Angstrom Fe layer and a 28Angstrom Sb layer. |
