发明名称 EXHAUST GAS TREATING DEVICE
摘要 <p>PURPOSE:To maintain a stable plasma condition stable against the variation of loading and simultaneously to execute the recovery or the detoxification of toxic substances produced from discharge treatment before the stage to reach a vacuum pump by impressing a magnetic flux into an opposing direction to a cathod and also packing the fragments of the metallic silicon into a space demarcated with an electrodes pair. CONSTITUTION:Into a tubular vessel having a gas introducing hole 2 and a gas exhausting hole 3 interlocked with the gas drafting space, an electro- discharging tube providing electrodes consisting of cathod pair 4 and anod pair 5 is provided. In the space consisting of cathod pair 4 and anod pair 5, the magnetic field of DC or AC is impressed in a direction opposed to the cathod. Additionally, silicon 6 is packed into the space demarcated with relevant electrode pair in the condition in contact with electrode or a non-contact state. By this means, the maintenance of a stable plasma condition against the variation of the loading at reduced pressure is attained and toxic substances produced by discharge treatment are recovered or detoxicated in the treating device before the stage to reach the vacuum pump.</p>
申请公布号 JPH04110015(A) 申请公布日期 1992.04.10
申请号 JP19900231490 申请日期 1990.08.30
申请人 MITSUI TOATSU CHEM INC 发明人 OE TAKASHI;MIURA AKIKO;MATSUDA TOSHINORI;ITAYA RYOHEI
分类号 B01D53/34;B01D53/32;B01D53/68 主分类号 B01D53/34
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