| 摘要 |
<p>A photosensitive base resin composition for a photoresist to be used in screen printing comprises a photopolymer, a polyester resin and an amino resin. In particular, the composition comprises 5-30 % of a poly(vinyl alcohol) which has been grafted with stilbazolium, as a photopolymer, 20-80 % alkyd resin and 10-70 % of amino resin (percentages given as solid matter of base composition). The base resin composition according to the invention affords a nontacky layer and has good stability.</p> |
