| 摘要 |
PROBLEM TO BE SOLVED: To enable obtaining an accurate wiring width of a circuit pattern and enable further improvement in the yield, even in the case where higher integration is provided. SOLUTION: Since a coating processing unit (COT) and a development processing unit (DEV) are arranged to face each other with a carrier device 11 (18) provided between them, the coating processing unit (COT) and the development processing unit (DEV) can be securely isolated from each other. Even if an alkaline component such as amine or the like is generated in the coating processing unit (COT), the alkaline component can be securely prevented from flowing into the development processing unit (DEV). |
