| 摘要 |
PROBLEM TO BE SOLVED: To obtain the positive photosensitive composition adapted to the use of an exposure light source in the wavelength region of a specified wavelength or lower by incorporating an acid generating compound and a resin having at least one kind of specified univalent polycyclic alicyclic group and a group to be decomposed by an acid and to be increased in solubility in an alkaline developing solution. SOLUTION: The positive photosensitive composition contains the compound to be allowed to generate an acid by irradiation with active light or radiation and the resin having at least one kind of univalent polyalicyclic group represented by the formula and a group to be decomposed by an acid and to be increased in solubility in the alkaline developing solution, thus permitting the obtained by positive photosensitive composition to be adapted to use of the exposure light source in the wavelength region of <=25 nm, especially, <=220 nm. In the formula, each of R1 -R4 is an alkyl, cycloalkyl, acyloxy, or hydroxy group or the like; and R is -R5 -CO-X1 -A1 -R6 or -R5 -CO-X1 -A2 -R7 or R5 -CO- NHSO2 -X2 -A-R7 or -COOY. |
