发明名称 X-RAY DIFFRACTOMETER
摘要 PROBLEM TO BE SOLVED: To provide an X-ray diffractometer by which a background component can be measured precisely even when another peak waveform exists near a target peak waveform in an X-ray diffraction curve and by which a sample can be quantitatively measured always precisely. SOLUTION: In an X-ray diffractometer, a sample is irradiated with X-rays, the X-rays which are diffracted by the sample are detected by an X-ray counter, and an X-ray diffraction curve A is found on the basis of its detection result. In this case, regarding a peak waveform P3 in the X-ray diffraction curve A, an area (surrounded by points a, b, c, d, e, f and a) within a measuring range from a measuring pointθ1 to a measuring pointθ2 is formed. A background component (surrounded by points a, d, e, f and a) is substracted from the value of the area. The pure area of the peak waveform P3 is found. The sample is quantitatively determined on the basis of the value of the area. A measuring pointθ3 and a measuring pointθ4 which are used to find a background component area set separately and independently of the measuring pointsθ1 ,θ2 which are used for a measurement as an X-ray diffraction measurement.
申请公布号 JPH11230922(A) 申请公布日期 1999.08.27
申请号 JP19980042827 申请日期 1998.02.09
申请人 RIGAKU DENKI KK 发明人 INOUE SHUICHI
分类号 G01N23/207;(IPC1-7):G01N23/207 主分类号 G01N23/207
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