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发明名称
薄膜电晶体用之黏着层
摘要
一种于绝缘体上制造一层多晶–或微晶矽层之方法,其包括一含矽绝缘层、成长一层由非晶型矽所构成之薄的黏着促进层于其上,并进一步成长一层多晶–或微晶矽层于该黏着促进层上。该等藉由PECVD方法所沉积之一序列层,显示多晶–或微晶矽于基板上的良好黏着性,并有利于如薄膜电晶体之半导体制造。
申请公布号
TW200630502
申请公布日期
2006.09.01
申请号
TW094126299
申请日期
2005.08.03
申请人
恩艾克西斯巴尔斯股份有限公司
发明人
海特伦夸克;杰罗米维雷特
分类号
C23C16/40;C23C16/24
主分类号
C23C16/40
代理机构
代理人
何金涂;林荣琳
主权项
地址
列支敦斯登大公国
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