RESIST PATTERN PREDICTION SYSTEM, METHOD FOR PREDICTING RESIST PATTERN, AND METHOD FOR CORRECTING MASK PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist pattern prediction system capable of predicting a resist pattern at high accuracy.

SOLUTION: The resist pattern prediction system is provided with an optical simulator 307 for predicting the light intensity distribution of a projected image on a resist film of a mask pattern, a reaction simulator 309 for predicting a resist pattern formed on the resist film by photosensitive reaction by using the light intensity distribution, a modulation module 308 for generating a modulation pattern obtained by modulating a circuit pattern corresponding to the mask pattern, and a correction module 310 for correcting the predicted resist pattern by calculating a linear sum of the predicted resist pattern and the modulation pattern.

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