发明名称 |
Doped silica glass crucible for making a silicon ingot |
摘要 |
A crucible adapted for use in formation of a silicon crystal comprises a crucible wall including a bottom wall and a side wall. An inner layer is formed on an inner portion of the crucible wall and has distributed therein a crystallization agent containing an element selected from the group consisting of barium, aluminum, titanium and strontium. The crucible is made by forming a bulk grain layer on an interior surface of a rotating crucible mold, generating a high-temperature atmosphere in the crucible cavity, and introducing inner grain and crystallization agent into the high-temperature atmosphere, fusing the inner grain to form a doped inner layer. The inner layers of crucibles disclosed herein are adapted to, when heated, crystallize according to any of three operating modes that retain a smooth inner surface and reinforce the structural rigidity of the crucible walls. |
申请公布号 |
EP1375702(A3) |
申请公布日期 |
2008.12.24 |
申请号 |
EP20030013702 |
申请日期 |
2003.06.17 |
申请人 |
HERAEUS QUARZGLAS GMBH & CO. KG;HERAEUS SHIN-ETSU AMERICA, INC. |
发明人 |
KEMMOCHI, KATSUHIKO, PH.D.;MOSIER, ROBERT O.;SPENCER, PAUL G. |
分类号 |
C03B20/00;C30B15/10;B32B1/02;B32B5/16;C03B19/09;C03C3/06;C03C17/23;C03C17/34;C30B29/06;C30B35/00 |
主分类号 |
C03B20/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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