发明名称 APPARATUS AND METHOD FOR CHARACTERIZING DEFECTS IN A TRANSPARENT SUBSTRATE
摘要 An apparatus (10) and method for detecting defects in a transparent substrate (12) by simultaneously using a combination of bright field and dark field light sources for illuminating the substrate. The apparatus is capable of detecting both inclusions and surface defects simultaneously while the substrate is in motion, simplifying the characterization of substrates in a manufacturing setting.
申请公布号 KR20090011020(A) 申请公布日期 2009.01.30
申请号 KR20087030094 申请日期 2007.05.09
申请人 CORNING INCORPORATED 发明人 LEBLANC PHILIP R;SCHNEIDER VITOR M;USTANIK CORREY R
分类号 G01N21/896;G01N21/89 主分类号 G01N21/896
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